The polishing pad is made by mixing nano-scale silica particles with a high-efficiency binder, and then uniformly coating the surface of the polyester film, and then drying and curing reaction.

The diamond polishing pad is suitable for portable electric or pneumatic grinding machines, and then the joint is connected, the power is 750-1500 W and the speed 2000-10000 revolutions. When working, apply a certain pressure on the machine while running the water 4-5 times on the surface of the stone to be sanded, and then the finer grinding plate No. 1 can be replaced.

At present, chemical mechanical polishing is widely used in the interlayer planarization processing of substrate wafers and multilayer wiring. The polishing pad is an important part of the chemical mechanical polishing (CMP) system. It has the functions of storing the polishing liquid and transporti

Polishing pads are also called polishing skins, polishing cloths, polishing pads, and are important auxiliary materials that determine the surface quality in chemical mechanical polishing.Polishing pads can be divided into abrasive polishing pads and non-abrasive polishing pads according to whether